Gas-sensing properties of Th/SnO2 thin-film gas sensor to trimethylamine

Citation
Ph. Wei et al., Gas-sensing properties of Th/SnO2 thin-film gas sensor to trimethylamine, J ELCHEM SO, 146(9), 1999, pp. 3536-3537
Citations number
7
Categorie Soggetti
Physical Chemistry/Chemical Physics","Material Science & Engineering
Journal title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
ISSN journal
00134651 → ACNP
Volume
146
Issue
9
Year of publication
1999
Pages
3536 - 3537
Database
ISI
SICI code
0013-4651(199909)146:9<3536:GPOTTG>2.0.ZU;2-A
Abstract
A tin dioxide (SnO2) thin film was prepared by metallorganic chemical vapor deposition from a tetramethyl tin (Me4Sn) precursor. The characterization of gas-sensing properties of trimethylamine (TMA) was reponed. The film was almost insensitive to TMA. When doped with thorium, it was very sensitive to TMA gas of very low level at working temperatures ranging from 200 to 36 0 degrees C, and the response and recovery times were very short. The optim um range of the working temperatures was from 270 to 310 degrees C, which w as very low as compared with calcined mixed powder of SnO2 and ruthenium. T he concentration range of gaseous TMA of linear response was 10-300 ppm. (C ) 1999 The Electrochemical Society. S0013-4651(98)12-049-9. All rights rese rved.