High-rate deposition of biaxially textured yttria-stabilized zirconia by dual magnetron oblique sputtering

Biaxially textured yttria-stabilized zirconia thin films were deposited at high rates (approximate to 3 mu m/h) using a two-target reactive magnetron sputtering geometry. The two small-area magnetron targets were mounted at 4 5 degrees or 56 degrees with respect to, and on opposite sides of, the subs trate normal. The films showed strong (001) out-of-plane texture. Azimuthal x-ray diffraction scans confirmed strong in-plane texture with a best (111 )-peak full width at half maximum of 23 degrees. The alignment was presumab ly due to directed impingement of sputtered atoms and/or energetic Ar neutr als reflected from the Zr-Y target surfaces. The film texture was not as st rong when only one sputter source was used. Sputtering geometries useful fo r large-scale deposition of textured films are described. (C) 1999 American Vacuum Society. [S0734-2101(99)01505-5].