Influence of the sputtering variables in the ion bombardment during off-axis deposition of YBa2Cu3Ox films

Authors
Acosta, M Ares, O Sosa, V Acosta, C Pena, JL
Citation
M. Acosta et al., Influence of the sputtering variables in the ion bombardment during off-axis deposition of YBa2Cu3Ox films, J VAC SCI A, 17(5), 1999, pp. 2879-2884
Citations number
24
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
17
Issue
5
Year of publication
1999
Pages
2879 - 2884
Database
ISI
SICI code
0734-2101(199909/10)17:5<2879:IOTSVI>2.0.ZU;2-1
Abstract
YBa2Cu3Ox, thin films were grown on SrTiO3 substrates using an off-axis-spu ttering configuration. Using a target with 100 h of sputtering runs, only m edium quality films were obtained. However, a fresh target allowed us to ob tain, at the same sputtering conditions, high quality films. The different film properties obtained as a function of the target age, gas pressure, and substrate position were discussed in the framework of a previous model of the angular distribution of oxygen ions which bombard and affect the growin g film. (C) 1999 American Vacuum Society. [S0734-2101(99)06305-8].