Optical constants of crystalline WO3 deposited by magnetron sputtering

Citation
Mj. Devries et al., Optical constants of crystalline WO3 deposited by magnetron sputtering, J VAC SCI A, 17(5), 1999, pp. 2906-2910
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
17
Issue
5
Year of publication
1999
Pages
2906 - 2910
Database
ISI
SICI code
0734-2101(199909/10)17:5<2906:OCOCWD>2.0.ZU;2-A
Abstract
Crystalline WO3-x is an infrared (IR) electrochromic material having possib le applications in satellite thermal control and IR switches. Optical const ants of electrochromic materials change upon ion intercalation, usually wit h H+ or Li+. Of primary concern for device design are the optical constants in both the intercalated and deintercalated states. In situ and ex situ el lipsometric data are used to characterize both the deposition process and t he optical constants of the films. Ex situ data from a UV-Vis-NIR ellipsome ter are combined with data from a mid-infrared Fourier-transform-infrared-b ased ellipsometer to provide optical constants over a spectral range of 0.0 31-6.1 eV. (C) 1999 American Vacuum Society. [S0734-2101(99)04905-2].