Visible and infrared photochromic properties of amorphous WO3-x films

Citation
Yg. Mo et al., Visible and infrared photochromic properties of amorphous WO3-x films, J VAC SCI A, 17(5), 1999, pp. 2933-2938
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
17
Issue
5
Year of publication
1999
Pages
2933 - 2938
Database
ISI
SICI code
0734-2101(199909/10)17:5<2933:VAIPPO>2.0.ZU;2-I
Abstract
The photochromic properties of sputtered amorphous tungsten oxide (a-WO3-x) films have been studied. The a-WO3-x films, prepared under different oxyge n partial pressures, were irradiated with ultraviolet (UV) light at room te mperature, and the transmission decrease of the films was measured. We used ellipsometry for the first time with and without UV irradiation to extract the optical indices n and k of magnetron direct-current sputtered films in the VIS/IR wavelength region. We have applied for the first time the Cauch y-Lorentz model for simulating the photochromic properties of the irradiate d a-WO3-x films. The results are consistent with previous reports showing t hat oxygen deficiency is very important in determining the photochromic pro perties of the a-WO3-x films. (C) 1999 American Vacuum Society. [S0734-2101 (99)03105-X].