Using patterns in microfiche as photomasks in 10-mu m-scale microfabrication

Microfiche has been used as the photomask in 1:1 contact photolithography t o generate structures of photoresist with features as small as 10 mu m. Opt ical reduction of images that were printed by a high-resolution image sette r on transparent polymer sheets generated patterns in microfiche. The photo resist patterns generated using microfiche as the photomask are useful in t he fabrication of elastomeric stamps/molds/membranes for soft lithography. Four test structures fabricated using microfiche as photomask and soft lith ography are used to evaluate the utility and resolution of this technique.