Electroless deposition of nanoscale copper patterns via microphase-separated diblock copolymer templated self-assembly

By use of an ultrathin film of microphase-separated poly(styrene-block-meth yl methacrylate) as a template, nanometer-scale patterns of tetraalkylammon ium passivated palladium colloids can be generated. This pattern serves, in turn, as the template for the electroless deposition of semicontinuous 20 nm wide copper nanostructures, which is approximately a factor of 2 smaller than feature sizes that can be generated by state-of-the-art lithographic processes.