Citation
R. Vollmer et al., Spin-reorientation transition in Ni films on Cu(001): The influence of H-2adsorption, PHYS REV B, 60(9), 1999, pp. 6277-6280
Citations number
31
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B-CONDENSED MATTER
ISSN journal
01631829
→ ACNP
Volume
60
Issue
9
Year of publication
1999
Pages
6277 - 6280
Database
ISI
SICI code
0163-1829(19990901)60:9<6277:STINFO>2.0.ZU;2-3
Abstract
The spin-reorientation transition of ultrathin Ni films is investigated by
means of in situ magneto-optical Kerr imaging as a function of the temperat
ure. A critical thickness d(c) of about 11.4 monolayers (ML) at T = 170 K a
nd 10.3 ML at 370 K has been found. Adsorbates strongly reduce this critica
l thickness. In particular the adsorption of about 2 langmuir H-2 reduces d
(c) to 7 ML at 170 K. The magnetocrystalline anisotropy energy of the clean
Ni surface K-2s = -153 mu eV/atom is strongly reduced by hydrogen adsorpti
on. [S0163-1829(99)13229-6].