Aj. Walton et al., TOTAL TCAD STRATEGY FOR DFM IN IC TECHNOLOGY DEVELOPMENT, IEE proceedings. Science, measurement and technology, 144(2), 1997, pp. 63-68
The authors present some of the simulation tools available to IC techn
ology and circuit designers and discuss their importance in a Design F
or Manufacturability (DFM) strategy. It is demonstrated how these simu
lators, when combined with Design Of Experiment (DOE) and Response Sur
face Methodology (RSM), can be used to increase engineering knowledge
while at the same time reducing the number of simulations required to
optimise a process. The idea of contour plotting response distribution
parameters to help determine robust manufacturing conditions is intro
duced together with a also methodology of using simulation results to
rapidly produce histograms of response distributions. An environment t
o help automate the above approach is presented, and its use as part o
f a DFM strategy is illustrated through an example of a process/device
optimisation.