Certain aspects of the physics of heteropolytypic junctions based on silico
n carbide are examined. It is known that the introduction of certain impuri
ties into the growth zone during epitaxy of silicon carbide results in the
growth of films whose polytype is different from that of the initial substr
ate. It is also known that these impurities lead to the formation of certai
n deep centers in the band gap of the conductor. Analysis of published data
performed in this paper shows that irradiation of SiC with various charged
particles also leads to the formation of these deep centers. It is assumed
that under certain experimental conditions transformation of the polytype
of the already grown epitaxial SiC structure is possible under the action o
f irradiation and subsequent annealing. (C) 1999 American Institute of Phys
ics. [S1063-7826(99)02009-8].