Properties of SiO2 and Si3N4 layers deposited by MF twin magnetron sputtering using different target materials

Si3N4 and SiO2 layers can be deposited by reactive sputtering in a stable m anner by using MF twin magnetron systems, The increasing demand for these m aterials for industrial applications makes it necessary to find new solutio ns for the target material. The up to now mostly used boron-doped poly-crys talline silicon suffers from serious drawbacks. In this paper, properties o f Si3N4, and SiO2 layers deposited by using casted Si/Al alloy targets as w ell as conventional Si targets are compared. The advantages of using casted alloy targets are presented, (C) 1999 Elsevier Science S.A. All rights res erved.