Properties of electrodeposited Ni/Cu multilayer structures

Citation
H. El Fanity et al., Properties of electrodeposited Ni/Cu multilayer structures, ANN CHIM-SC, 24(7), 1999, pp. 505-508
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
ANNALES DE CHIMIE-SCIENCE DES MATERIAUX
ISSN journal
01519107 → ACNP
Volume
24
Issue
7
Year of publication
1999
Pages
505 - 508
Database
ISI
SICI code
0151-9107(199907)24:7<505:POENMS>2.0.ZU;2-S
Abstract
The interface structure and magnetic properties of electrodeposited Ni/Cu m ultilayers have been investigated. The layer thickness of both Cu and Ni ra nge from 200 to 6000 Angstrom. The Ni and the Cu layers are polycrystalline with a dominant (111) fibre texture. The magnetization and M-H loops of th e samples were determined using a vibrating sample magnetometer (VSM). Ferr omagnetic resonance (FMR) was observed at 9.8 GHz. The linewidth of the gra nular multilayer is attributed either to some roughness or to small fluctua tions of magnetization and is about 1.5 kOe when the applied magnetic field is in the plane of the film.