Micropatterning of titanium dioxide on self-assembled monolayers using a liquid-phase deposition process

Authors
Koumoto, K Seo, S Sugiyama, T Seo, WS Dressick, WJ
Citation
K. Koumoto et al., Micropatterning of titanium dioxide on self-assembled monolayers using a liquid-phase deposition process, CHEM MATER, 11(9), 1999, pp. 2305
Citations number
61
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
CHEMISTRY OF MATERIALS
ISSN journal
08974756 → ACNP
Volume
11
Issue
9
Year of publication
1999
Database
ISI
SICI code
0897-4756(199909)11:9<2305:MOTDOS>2.0.ZU;2-8
Abstract
The fabrication of micropatterned TiO2 films on deep UV patterned self-asse mbled monolayers (SAMs) of phenylsiloxane is described. The patterned SAM w as immersed in an acidic, aqueous TiF62- solution to directly deposit cryst alline TiO2 (anatase) onto both hydrophobic (masked) and hydrophilic (irrad iated) surface regions without the need for postdeposition heat curing. Sub sequent sonication selectively removed weakly bound TiO2 present in the hyd rophobic regions, resulting in a micropatterned TiO2 thin film.