Low-frequency noise properties of dynamic-threshold (DT) MOSFET's

Citation
Tl. Hsu et al., Low-frequency noise properties of dynamic-threshold (DT) MOSFET's, IEEE ELEC D, 20(10), 1999, pp. 532-534
Citations number
3
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE ELECTRON DEVICE LETTERS
ISSN journal
07413106 → ACNP
Volume
20
Issue
10
Year of publication
1999
Pages
532 - 534
Database
ISI
SICI code
0741-3106(199910)20:10<532:LNPOD(>2.0.ZU;2-B
Abstract
This paper shows that MOSFET operated in dynamic-threshold (DT) mode [1] (V -body = V-gate) is more suitable for low-noise RF/analog applications than those operated in conventional mode (V-body = V-source). Detailed low-frequ ency noise properties of these two modes of device operation were compared for 0.31-mu m gate MOSFET's, in which NMOS's are surface-channel devices (S .C.) and PMOS's are buried-channel (B.C.) devices. Experimental data show t hat when the devices are biased at same transconductance, the low-frequency noise in DT mode is 30 times lower (at g(m) = 2.2 x 10(-3) S) than that in the conventional mode (conventional mode) for the B.C. devices and ten tim es (at g(m) = 2.9 x 10(-3) S) lower for the S.C. devices.