Rr. Bilyalov et al., Use of porous silicon antireflection coating in multicrystalline silicon solar cell processing, IEEE DEVICE, 46(10), 1999, pp. 2035-2040
The latest results on the use of porous silicon (PS) as an antireflection c
oating (ARC) in simplified processing for multicrystalline silicon solar ce
lls are presented. The optimization of a PS selective emitter formation res
ults in a 14.1% efficiency multicrystalline (5 x 5 cm(2)) Si cell with evap
orated contacts processed without texturization, surface passivation, or ad
ditional ARC deposition. Specific attention is given to the implementation
of a PS ARC into an industrially compatible screenprinted solar cell proces
s. Both the chemical and electrochemical PS ARC formation method are used i
n different solar cell processes, as well as on different multicrystalline
silicon materials. Efficiencies between 12.1 and 13.2% are achieved on larg
e-area (up to 164 cm(2)) commercial Si solar cells.