Antimonide-based devices for thermophotovoltaic applications

Citation
Cw. Hitchcock et al., Antimonide-based devices for thermophotovoltaic applications, IEEE DEVICE, 46(10), 1999, pp. 2154-2161
Citations number
22
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON ELECTRON DEVICES
ISSN journal
00189383 → ACNP
Volume
46
Issue
10
Year of publication
1999
Pages
2154 - 2161
Database
ISI
SICI code
0018-9383(199910)46:10<2154:ADFTA>2.0.ZU;2-V
Abstract
Thermophotovoltaic (TPV) devices have been fabricated using ternary and qua ternary layers grown by metalorganic vapor phase epitaxy. (MOVPE) on GaSb s ubstrates, GaInSb ternary devices were grown with buffer layers to accommod ate the lattice mismatch, and GaInAsSb quaternary devices were grown with L attice-matched compositions. Improved devices are obtained when optical abs orption occurs in the p-layer due to the longer minority carrier diffusion length. Thick emitter p/n devices are limited by surface recombination, wit h highest quantum efficiency and lowest dark current being achieved with ep itaxially grown surface passivation layers on lattice-matched MOVPE quatern aries, Thin emitter/thick base, n/p devices are very promising since surfac e passivation is less critical than for p-emitter devices.