Structure of chemical vapor deposition titania/silica gel

Citation
R. Leboda et al., Structure of chemical vapor deposition titania/silica gel, J COLL I SC, 218(1), 1999, pp. 23-39
Citations number
49
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF COLLOID AND INTERFACE SCIENCE
ISSN journal
00219797 → ACNP
Volume
218
Issue
1
Year of publication
1999
Pages
23 - 39
Database
ISI
SICI code
0021-9797(19991001)218:1<23:SOCVDT>2.0.ZU;2-G
Abstract
The structure of porous silica gel/titania synthesized using chemical vapor deposition (CVD) of titania via repeated reactions of TiCl4 with the surfa ce and subsequent hydrolysis of residual Ti-CI bonds at different temperatu res was investigated by means of low-temperature nitrogen adsorption-desorp tion, X-ray diffraction (XRD), IR spectroscopy, and theoretical methods. A globular model of porous solids with corpuscular structure was applied to e stimate the porosity parameters of titania/silica gel adsorbents. The utili zation of this model is useful, for example, to predict conditions for synt hesis of titania/silica with a specified structure. Analysis of pore parame ters and fractal dimension suggests that the porosity and fractality of sam ples decrease with increasing amount of TiO2 covering the silica gel surfac e in a nonuniform layer, which represents small particles embedded in pores and larger particles formed at the outer surface of silica globules. Theor etical simulation shows that the Si-O-Ti linkages between the cover and the substrate can be easily hydrolyzed, which is in agreement with the IR data corresponding to the absence of a band at 950 cm(-1) (characteristic of Si -O-Ti bridges) independent of the concentration of CVD-titania. (C) 1999 Ac ademic Press.