Photolysis reaction mechanism of dibenzophenoneoxime hexamethylenediurethane, a new type of photobase generator

Citation
Hs. Hwang et al., Photolysis reaction mechanism of dibenzophenoneoxime hexamethylenediurethane, a new type of photobase generator, J PHOTOCH A, 126(1-3), 1999, pp. 37-42
Citations number
23
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY
ISSN journal
10106030 → ACNP
Volume
126
Issue
1-3
Year of publication
1999
Pages
37 - 42
Database
ISI
SICI code
1010-6030(199909)126:1-3<37:PRMODH>2.0.ZU;2-Y
Abstract
The photochemical and photophysical phenomena of dibenzophenoneoxime hexame thylenediurethane have been investigated with laser flash photolysis to und erstand its participating mechanism in polymer curing reactions. Owing to t he extremely short Lifetimes of the first excited singlet (22 ps) and tripl et (10 ns) (n, pi*) states, that the molecules undergo, with a small quantu m efficiency of 10(-4), decarboxylation at the lowest triplet state with th e rate constant of 10(6) s(-1), forming dehydrogenated iminyl and aminyl ra dicals. Abstracting a hydrogen atom in the time scale of 270 mu s, the imin yl radical converts mainly into diphenyl-1-imine which, with being irradiat ed, dehydrogenates and dimerizes to yield benzophenone azine. Meanwhile, th e aminyl radical abstracts H to generate benzophenoneoxime-urethanyl hexame thyleneamine, which, as a photobase, raises solution pH. (C) 1999 Elsevier Science S.A. All rights reserved.