Preparation of photoreactive zirconium precursor stabilized by aromatic diethanolamines and its application for fine patterning

The chemical stability and photoreactivity of zirconium precursor was succe ssfully improved by the additions of N-phenyldiethanolamine and diethanolam ine. The prepared solution has strong absorptions at 256 and 302 nm, leadin g to the effective absorption of ultra-violet light. Photolithographic patt erning of zirconium precursor him could be obtained by the UV irradiation. It is reported that the metal alkoxide solutions chemically modified with a lkanolamines, such as diethanolamine and triethanolamine, can be used for t he patterning of the metal oxide films. However, the procedure possesses a weak points in how to make a precursor with little absorptions in the regio ns of the emission of a convenient mercury lamp. The present modification h as solved this problem by the chemical modification of zirconium iso-propox ide upon additions of N-phenyldiethanolamine and diethanolamine.