Epitaxial growth of PbSe/PbEuSe/BaF2/CaF2 heterostructures was carried out
by a molecular beam epitaxy on Si(111) wafers. Successful transfer of 3-mu
m thick PbSe/PbEuSe epilayers was accomplished by bonding the MBE-grown sam
ples face down to polished copper plates followed by the removal of the sil
icon substrate by dissolving the BaF2 buffer layer in water. Nomarski micro
scopy and surface profile characterization showed that the transferred PbSe
/PbEuSe layer had mirror-like morphology. High-resolution X-ray diffraction
measurements demonstrated that the PbSe/PbEuSe epilayers maintained high c
rystalline quality after transfer, and surface analysis by X-ray photoelect
ron spectroscopy indicated complete removal of BaF2 buffer layer. The above
results indicate that bonded PbSe/PbEuSe could be used as a new substrate
material for regrowth of high quality PbSe-related heterostructure devices.
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