Electroreflectance bias-wavelength mapping of the modulation Si delta-doped pseudomorphic GaAs/InGaAs/AlGaAs structure

Citation
T. Tomaszewicz et al., Electroreflectance bias-wavelength mapping of the modulation Si delta-doped pseudomorphic GaAs/InGaAs/AlGaAs structure, APPL PHYS L, 75(14), 1999, pp. 2088-2090
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
75
Issue
14
Year of publication
1999
Pages
2088 - 2090
Database
ISI
SICI code
0003-6951(19991004)75:14<2088:EBMOTM>2.0.ZU;2-S
Abstract
The electroreflectance bias-wavelength mapping is proposed as a tool for ch aracterization of low-dimensional structures. The results of room-temperatu re measurements on modulation Si delta-doped pseudomorphic GaAs/InGaAs/AlGa As heterostructure with high mobility two-dimensional electron gas are pres ented. Franz-Keldysh oscillations (FKO) in GaAs layer are analyzed using fa st Fourier transform (FFT) mapping in order to find an electric field in th e GaAs layer. Two frequencies of FKO are identified in the FFT spectra, whi ch are attributed to transitions involving heavy and light holes. Two trans itions within the InGaAs quantum well are found at zero bias and an additio nal transition becomes apparent in reversely biased structure. Spectral fea tures due to spin-orbit split holes in GaAs, back AlGaAs barrier, and AlGaA s/GaAs superlattice are also identified. (C) 1999 American Institute of Phy sics. [S0003-6951(99)02540-1].