Fp. Korshunov et al., The influence of radiation-induced thermal defects on characteristics of power silicon p-n-structures, DAN BELARUS, 43(1), 1999, pp. 113-116
Data of a study of the influence of the effective recombination centres for
med in diffusion p-n-structures on Si exposed to electron irradiation follo
wed by annealing in the temperature range 400-600 degrees C on their charac
teristics in the operation temperature range 77-400 K are given;in this art
icle.