Diffuse x-ray reflectivity study of interface roughness in Mo/Si multilayers

Diffuse x-ray reflectivity intensities mere measured to characterize interf ace morphologies of Mo/Si multilayers with and without interleaved carbon t hin layers. Parameters related to the interface morphologies can be obtaine d by fitting the measured intensities within the distorted wave Born approx imation in such a way that intermixing widths of graded interfaces, correla ted interface roughness amplitudes and vertical correlation lengths are obt ained. The interface parameters of Mo/Si and Mo/C/Si/C multilayers are comp ared for as-grown samples and annealed ones.