Studies on magnetron sputtering assisted by inductively coupled RF plasma for enhanced metal ionization

Planar magnetron discharge is assisted by inductively coupled plasmas, whic h are sustained by a helical RF antenna immersed in the plasma. Use of the technique significantly enhances the plasma density. The effects of antenna termination when grounded or floating have been investigated by a simple c ircuit analysis. The floating antenna configuration effectively suppresses the anomalous rise of the plasma potential and thus the plasma source can b e stably operated at a higher input of RF power to generate plasmas with de nsities as high as >10(12) cm(-3).