Extended anode effect in coaxial magnetron pulsed plasmas for coating the inside surface of narrow tubes

In order to coat functional thin films onto the inside surface of narrow tu bes, a coaxial magnetron pulsed plasma (CMPP) device has been developed. Th e feature of this device is that deposited conductive films play the role o f an anode. Consequently, plasmas are generated away from the anode located at one end of the tube and the distribution of film thickness widens with increasing deposition time. This is called the extended anode effect. The s hifting velocity of the main position for plasma generation was dependent o n the properties of the target materials. The shifting velocity increased w ith sputtering yield and decreased with the electrical resistivity of targe t materials.