Plasma production and wave propagation in a plasma source using lower hybrid waves

Citation
T. Kikuchi et al., Plasma production and wave propagation in a plasma source using lower hybrid waves, JPN J A P 1, 38(7B), 1999, pp. 4351-4356
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
38
Issue
7B
Year of publication
1999
Pages
4351 - 4356
Database
ISI
SICI code
Abstract
The lower hybrid wave, which is in the same frequency range as the helicon wave, is resonant at the lower hybrid frequency and does not penetrate into the higher density side of the plasma. This creates the localized ionizati on region at the outer plasma radii and leads to uniform plasma production. Typical plasma densities in the plasma source designed to take advantage o f this characteristic of the lower hybrid wave are of the order of 10(11) c m(-3) in the source region for 10 mTorr He and 1 kW radio frequency (rf) po wer. The radial density profile can be controlled by changing the location of the lower hybrid resonance by changing the magnetic field B-0. We measur ed the radial dependence of rf electric and magnetic fields to determine if lower hybrid wave and helicon wave were present.