Particle growth kinetics in silane RF discharges

Growth kinetics of particles above 10 nm in size in silane RF discharges ha s been extensively studied and fairly well clarified. Moreover, recent deve lopments of new measurement methods for particles below 10 nm in size have led to a rapid advance in understanding the growth processes of small parti cles. Such previous studies are reviewed with the accent on their initial g rowth phase corresponding to a particle size range below 10 nm. The notable effect of pulse modulation of the RF discharges of suppressing panicle gro wth is also described. Both the growth of particles and their suppression b y the modulation can be explained by a model taking into account the produc tion of key radicals (highly reactive neutral radicals of SIH2 having a hig h production rate), particle growth reactions initiated by the key radicals and panicle diffusion in the radical production region.