Tight-binding molecular dynamics simulation of desorbed SiO molecule during the oxidation of Si(111) surface

Citation
A. Yamada et al., Tight-binding molecular dynamics simulation of desorbed SiO molecule during the oxidation of Si(111) surface, JPN J A P 1, 38(4B), 1999, pp. 2434-2437
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
38
Issue
4B
Year of publication
1999
Pages
2434 - 2437
Database
ISI
SICI code
Abstract
Tight-binding molecular dynamics calculations have been carried out to stud y the SiO desorption at high temperature during the oxidation of Si(111) su rface. In our model, the on-top site of SiO at the Si(111) surface was heat ed partially on purpose. The high wagging and stretching energies related t o the SiO are considered to be the origin of SiO desorption for the present calculations. Vibrational frequencies at the oxygen adsorption site on Si( 111) surface and both rovibrational and translational energies of desorbed SiO molecule were calculated and compared with the experimental results. Th e SiO molecule desorbed at the thermal equilibrium state which is in agreem ent with the experimental results.