Estimation of the life of synthetic silica glass under long time irradiation by ArF excimer laser

Authors
Shimbo, M Nakajima, T Tsuji, N Kakuno, T Obara, T
Citation
M. Shimbo et al., Estimation of the life of synthetic silica glass under long time irradiation by ArF excimer laser, JPN J A P 2, 38(8A), 1999, pp. L848-L850
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS → ACNP
Volume
38
Issue
8A
Year of publication
1999
Pages
L848 - L850
Database
ISI
SICI code
Abstract
The life of synthetic silica glass under ArF excimer laser irradiation was estimated in relation to the laser energy density by in-situ photoabsorptio n measurements under exposure to more than 10(7) shots. Dissolved hydrogen increases the life whereas OH in the glass scarcely influences it. Usual ph otomask glass is found to be tolerable to more than 10(11) shots at 0.1 mJ/ cm(2) of laser irradiation intensity.