Lithographically patterned wires of the charge-density-wave conductor Rb0.30MoO3

We have developed a technology for the patterning of thin films of the char ge-density-wave (CDW) conductor Rb0.30MoO3. By means of photolithography an d Ar-ion milling, wire structures are defined in the films. The Rb0.30MoO3 wires are contacted by (sub)micron Au contacts, which are fabricated by opt ical and electron-beam lithographic techniques. Electrical transport measur ements clearly demonstrate the CDW state in our patterned structures, inclu ding CDW sliding. Patterned wires enable the study of CDWs on mesoscopic le ngth scales. (C) 1999 American Institute of Physics. [S0021-8979(99)00520-4 ].