Analytical solutions of film planarization for periodic features

Citation
Py. Wu et al., Analytical solutions of film planarization for periodic features, J APPL PHYS, 86(8), 1999, pp. 4657-4659
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
86
Issue
8
Year of publication
1999
Pages
4657 - 4659
Database
ISI
SICI code
0021-8979(19991015)86:8<4657:ASOFPF>2.0.ZU;2-C
Abstract
Analytical solutions of film profiles and degree of planarization for perio dic features during the spin coating process are presented. This article sh ows that the degree of planarization is independent of Omega(2) and changes slightly with the dimensionless line spacing alpha for Omega(2)> 300. The governing dimensionless parameter Omega(2) represents the ratio of centrifu gal force to surface tension force during spin coating. In the cases of low Omega(2) (Omega(2)< 1), the degree of planarization decreases with increas ing alpha for a fixed Omega(2). (C) 1999 American Institute of Physics. [S0 021-8979(99)05120-8].