Study on silicon melt convection during the RF-FZ crystal growth process I. experimental flow visualization

Citation
T. Munakata et I. Tanasawa, Study on silicon melt convection during the RF-FZ crystal growth process I. experimental flow visualization, J CRYST GR, 206(1-2), 1999, pp. 23-26
Citations number
10
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
206
Issue
1-2
Year of publication
1999
Pages
23 - 26
Database
ISI
SICI code
0022-0248(199910)206:1-2<23:SOSMCD>2.0.ZU;2-D
Abstract
Silicon melt convection during the floating zone (FZ) crystal growth proces s under radio-frequency (RF) heating has been observed directly by using an X-ray radiography system with particle tracking velocimetry (PTV) in order to investigate the effect of the RF-induced electromagnetic field on the s ilicon melt convection. The result reveals that the silicon melt convection is fully affected by the RF induced electromagnetic field and the directio n of convection becomes opposite to the natural convection. The obtained ma ximum velocity was 0.1 m/s which was 4-5 times higher than CZ system and th e velocity field is fluctuated randomly. This will probably cause strong st riation in the crystal. (C) 1999 Elsevier Science B.V. All rights reserved.