L. Arnaud et al., Influence of pulsed DC current stress on Electromigration results in AlCu interconnections; analysis of thermal and healing effects, MICROEL REL, 39(6-7), 1999, pp. 773-784
Electromigration experiments have been performed on AlCu interconnect struc
tures subjected to unipolar or bipolar current stresses. Activation energy
values were similar between AC and DC stress suggesting that the same failu
re mechanisms occurred in both cases. From 100 Hz to 1 MHz, the results fol
lowed an average current model for which the sample is stressed by an effic
ient current density averaged over the period and Joule heating is taken in
to account with an original thermal model. The average current model was al
so verified for bipolar currents and provided very large increase of median
time to failure when symmetric signals were considered. Asymmetric signals
lead to unipolar electromigration behavior. At 1 Hz, the results tend towa
rd an on time model for which matter diffusion occurred only during the app
lication of the current. (C) 1999 Elsevier Science Ltd. All rights reserved
.