Fabrication and electrooptical characterisation of an AFLC-MIM device

The electrooptical behavior of antiferroelectric tristable cells with activ e matrices has been evaluated by preparing MIM displays filled with Chisso CS-4001 AFLC material. MIMs were fabricated by a standard 3-mask process. T he displays are 2(n), 96x128 pixel multiplexed test cells. The cell gap is 1.5 mu m in all cases; silica spacers were used. A number of alignment laye rs and variations in surface conditioning were employed. Single face and do uble face treatments were tested. An analysis of addressing waveforms has b een carried out, aiming to obtain reproducible analogue grayscales, The dyn amic range, temperature dependence, and spatial homogeneity of the resultin g optical response are presented.