In situ observation of strain-induced optical anisotropy of ZnSxSe1-x/GaAs(110) during molecular-beam epitaxy

Citation
T. Hanada et al., In situ observation of strain-induced optical anisotropy of ZnSxSe1-x/GaAs(110) during molecular-beam epitaxy, PHYS REV B, 60(12), 1999, pp. 8909-8914
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B-CONDENSED MATTER
ISSN journal
01631829 → ACNP
Volume
60
Issue
12
Year of publication
1999
Pages
8909 - 8914
Database
ISI
SICI code
0163-1829(19990915)60:12<8909:ISOOSO>2.0.ZU;2-S
Abstract
In-plane optical anisotropy induced by biaxial strain of pseudomorphic ZnSx Se1-x layers grown on GaAs(110) is observed around the band-gap energy by r eflectance difference spectroscopy (RDS). The evolution of the strain-induc ed peaks with increasing film thickness is analyzed by the three-phase (sub strate-overlayer-ambient) model. The magnitude and shape of the peaks are, respectively, correlated with the strain and the film thickness. Dielectric -function anisotropies of the pseudomorphic overlayers an obtained using a decomposition method of RD spectra and their imaginary part have a sharp pe ak at fundamental-gap energy.