The barrier heights of PdIn, Ni/Ga/Ni and Re Schottky contacts to n-GaN wer
e investigated by current-voltage and capacitance-voltage measurements. Ele
mental Pd and Ni contacts were also investigated for comparison. In each ca
se, the barrier heights were determined as a function of annealing temperat
ure. It was shown that stoichiometric PdIn contacts were more stable than P
d-only contacts. Similarly, Ni/Ga/Ni diodes were found to be more stable th
an Ni diodes. Both the Ni/Ga/Ni contact and the elemental Re contact were s
table on short-term annealing up to 700 degrees C.