Approaches to designing thermally stable Schottky contacts to n-GaN

Citation
Hs. Venugopalan et al., Approaches to designing thermally stable Schottky contacts to n-GaN, SEMIC SCI T, 14(9), 1999, pp. 757-761
Citations number
27
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
ISSN journal
02681242 → ACNP
Volume
14
Issue
9
Year of publication
1999
Pages
757 - 761
Database
ISI
SICI code
0268-1242(199909)14:9<757:ATDTSS>2.0.ZU;2-9
Abstract
The barrier heights of PdIn, Ni/Ga/Ni and Re Schottky contacts to n-GaN wer e investigated by current-voltage and capacitance-voltage measurements. Ele mental Pd and Ni contacts were also investigated for comparison. In each ca se, the barrier heights were determined as a function of annealing temperat ure. It was shown that stoichiometric PdIn contacts were more stable than P d-only contacts. Similarly, Ni/Ga/Ni diodes were found to be more stable th an Ni diodes. Both the Ni/Ga/Ni contact and the elemental Re contact were s table on short-term annealing up to 700 degrees C.