P. Spatenka et al., Langmuir probe measurements of plasma parameters in a planar magnetron with additional plasma confinement, VACUUM, 55(2), 1999, pp. 165-170
Langmuir probe measurements have been carried out in a planar magnetron spu
ttering system with an additional plasma confinement which can be operated
at low argon pressures (down to 3.4 x 10(-2) Pa) when target utilization gr
eater than 80% can be achieved. The electron density, electron temperature,
relative densities of low- and high-energy groups of electrons and the dif
ference between the plasma and floating potential have been determined in v
arious positions between the target and a substrate at the argon pressures
in the range from 0.05 to 5 Pa. It has been proved that the additional magn
etic field results, particularly in larger distances from the target at low
er pressures, in the formation of structured electron energy distributions
with a substantial contribution from a high-energy group of electrons, whic
h is responsible for enhanced gas ionization and relatively high values obs
erved for the difference between the plasma and the floating potential. (C)
1999 Elsevier Science Ltd. All rights reserved.