High density plasmas for micro- and optoelectronics processing

Authors
Delmotte, F Hugon, MC Agius, B Irene, EA
Citation
F. Delmotte et al., High density plasmas for micro- and optoelectronics processing, VIDE, 54(291), 1999, pp. 11
Citations number
17
Categorie Soggetti
Material Science & Engineering
Journal title
VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
ISSN journal
12660167 → ACNP
Volume
54
Issue
291
Year of publication
1999
Database
ISI
SICI code
1266-0167(1999)54:291<11:HDPFMA>2.0.ZU;2-Z
Abstract
This paper is an overview of the different kinds of plasmas used in microel ectronics and optoelectronics processes such as surface preparation, etchin g or thin film deposition. Emphasis is on the basic ideas of plasma process es in particular high density plasmas and on the comparison of plasma metho ds from the point of view of the duality of the material produced.