Dielectric film deposition for optical applications

Electron cyclotron resonance chemical vapor deposition has been used to fab ricate filters with optical application. Two examples were chosen to illust rate its capability. First, rugate filter was deposited on glass substrate from silane precursor and by varying O-2/N-2 ratio of plasma gases to obtai n the continuous index variation (between 1.744 and 1.456 at 500 nm). Secon d, TiO2/SiO2 Bragg mirror were deposited with oxygen plasma and, respective ly, titanium isopropoxide (TIPT) and tetraethoxysilane (TEOS), as precursor s. In situ spectroscopic ellipsometry was used to characterize material pro perties and to monitor structure depositions. Eventually the filters were c haracterized by spectroreflectometry.