Developing a 0.18-micron CMOS process

Authors
Haond, M Basso, MT deCoster, W Gerritsen, E Guelen, J Lair, C
Citation
M. Haond et al., Developing a 0.18-micron CMOS process, IEEE MICRO, 19(5), 1999, pp. 16-22
Categorie Soggetti
Computer Science & Engineering
Journal title
IEEE MICRO
ISSN journal
02721732 → ACNP
Volume
19
Issue
5
Year of publication
1999
Pages
16 - 22
Database
ISI
SICI code
0272-1732(199909/10)19:5<16:DA0CP>2.0.ZU;2-2
Abstract
THE AUTHORS DISCUSS WAYS TO DEVELOP CERTAIN MODULES THAT ARE REQUIRED TO GE NERATE A NEW GENERATION OF DEVICES AND MEET TARGETED GOALS. THEY ALSO INTRO DUCE THE INTEGRATION OF LOW-k MATERIAL TO IMPROVE IMD PARASITIC CAPACITANCE .