Dissolution kinetics of silicon nitride in aqueous suspension

Citation
Bv. Zhmud et L. Bergstrom, Dissolution kinetics of silicon nitride in aqueous suspension, J COLL I SC, 218(2), 1999, pp. 582-584
Citations number
8
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF COLLOID AND INTERFACE SCIENCE
ISSN journal
00219797 → ACNP
Volume
218
Issue
2
Year of publication
1999
Pages
582 - 584
Database
ISI
SICI code
0021-9797(19991015)218:2<582:DKOSNI>2.0.ZU;2-7
Abstract
A general system of equations describing the dissolution of polydisperse so lids having a porous particulate structure is set up and applied to study t he hydrolysis and subsequent dissolution of silicon nitride powder in aqueo us suspensions. The latter process has been found to follow a simple kineti c equation, c(t) = c(s)[1 - exp(-kt)], with the dissolution rate constant k = 2.3 x 10(-6) s(-1) (or 2.5 x 10(-11) mol m(-2) s(-1)) and the saturation concentration c(s) = 3.2 mmol dm(-3) at room temperature and pH 9. The rol e of diffusion is unimportant, so the concentration of soluble species in p ore water changes almost simultaneously with their concentration in the sur rounding solution. (C) 1999 Academic Press.