High-performance low-temperature poly-Si TFTs and circuits

Citation
H. Asada et al., High-performance low-temperature poly-Si TFTs and circuits, NEC RES DEV, 40(4), 1999, pp. 433-436
Citations number
9
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
NEC RESEARCH & DEVELOPMENT
ISSN journal
0547051X → ACNP
Volume
40
Issue
4
Year of publication
1999
Pages
433 - 436
Database
ISI
SICI code
0547-051X(199910)40:4<433:HLPTAC>2.0.ZU;2-J
Abstract
High-performance low-temperature poly-Si TFTs (Thin Film Transistors) and b asic digital and analog circuits have been developed to open up the possibi lity of integrating systems on glass substrates. The TFTs were fabricated o n a glass substrate, using excimer laser annealing. The threshold voltage w as 0.86 V and the field effect mobility was 168 cm(2)/Vs for an n-channel T FT, while the threshold voltage was -0.9 V and the mobility was 129 cm(2)/V s for a p-channel TFT. The maximum scanning frequency for the 4-mu m-gate b i-directional shift register, which needs no additional TFTs for changing t he shift-direction, was 47 MHz at 5-V supply. The unity-gain frequency of a CMOS TFT operational amplifier, used to build analog circuits, was 1.4 MHz at supply voltages of +/-8 V.