The effects of interstitial carbon on the electronic and: mechanical proper
ties of copper are studied theoretically. Semiempirical methodology, atomis
tic simulations and first-principles density-functional embedded-cluster sc
hemes are combined to extract some understanding of the diffusion: process
and related degradation of Cu-C composite materials under extremes of tempe
rature and stress. High-resolution scanning electron microscopy results are
presented, which demonstrate the existence of a solid solution zone at the
Cu-C interface.