Using Taguchi's L-16 orthogonal array and Yate's method, the optimal c
onditions for the direct metallization of copper on Teflon-based print
ed circuit boards are determined. The performances of direct copper me
tallization techniques are evaluated using the peel strength and the t
otal energy consumption used in the plating process. The peel strength
of the copper film was found to be approximately 310.7 g cm(-1), whic
h is comparable to existing products developed using a commercial auto
catalytic electrodeless copper plating method.