THE DOUBLE-RING MAGNETRON PROCESS MODULE - A TOOL FOR STATIONARY DEPOSITION OF METALS, INSULATORS AND REACTIVE SPUTTERED COMPOUNDS

The double ring magnetron module has become a powerful tool for solvin g a great variety of thin film deposition tasks in the field of statio nary sputter deposition of substrates in the diameter range of 200 mm at high deposition rates. Different variants of powering - DC, MF (50 kHz) and RF (13.56 MHz) - that allow to sputter conductive and insulat ing materials will be compared. In reactive sputtering new solutions f or magnetron design, reactive gas inlet, power input and control syste ms will be reported, that guarantee during the target life time the st able, reproducible and uniform deposition of materials like SiO2 or Al 2O3.