Photoluminescence (PL) properties of SiNx (0.51 < x < 1.3) films are studie
d. A visible luminescence near the UV region is observed and the PL intensi
ty and peak positions are found to be governed by the excess silicon compos
ition. A large scale potential fluctuation due to the spatial variation of
chemical composition in SINx is proposed to explain these observations, In
addition, non-radiative recombination centers (N3Si ., N2SiSi ., NSi2Si .,
or Si3Si .), which have prominent effect on the luminescence intensity, are
also studied using electron spin resonance (ESR) measurement. The ESR resu
lts suggest that the excess silicon content should not be too high in order
to have a strong PL. (C) 1999 Elsevier Science S.A. All rights reserved.