Direct structure depth profiling of polycrystalline thin films by X-ray diffraction and its application

To analyze the polycrystalline thin films and surface layer, a direct metho d has been developed to obtain all X-ray diffraction information, including the peak intensity, peak position and peak profile, of each layer at vario us depths, respectively. This method can be named as direct structure depth profiling technique of X-ray diffraction (XRD), through which more detaile d and distinct structure information can be obtained than the previous meth ods. The Pd/Ag bilayer sample annealed at 490 degrees C was used for calibr ation of the method and the structure of each layer at various depths was o btained by direct calculation. According to the resolved patterns, the elem ental concentration depth profile of the bilayer sample was calculated and the results were in good agreement with that from Auger electron spectrosco py (AES), confirming the validity of the method. (C) 1999 Elsevier Science S.A. All rights reserved.