P. Sandstrom et al., Structure evolution in Ag/Ni multilayers grown by ultra high vacuum DC magnetron sputtering, THIN SOL FI, 353(1-2), 1999, pp. 166-173
Ag/Ni multilayers have been grown by ultra high vacuum d.c. magnetron sputt
ering onto oxidized Si(001) substrates held at room temperature. Films were
grown in both Ar and Kr discharges at different sputtering pressures p. Th
e effects of the different discharge pressures and post-deposition annealin
g were investigated. The structure evolution was studied using atomic force
microscopy (AFM), X-ray diffraction (XRD) and transmission electron micros
copy (TEM). XRD pole figure analysis show that all films exhibit a pronounc
ed [111] fiber texture. Sputtering using low pressures resulted in a reduct
ion of the surface roughness, compared to films grown at higher pressures,
and films with rms roughness values as low as 1-2 nm were obtained. XRD ana
lysis show that also the definition of the layer interfaces and the crystal
linity of the films improved when the pressure was lowered and when using A
r instead of Kr. The increase in surface roughness with discharge pressure
is explained by a reduced adatom mobility on the growing film surface at hi
gher pressures and a wider range of incidence angles of the adatoms when ar
riving at the surface due to gas scattering. The improved crystalline quali
ty when using Ar instead of Kr is explained using similar arguments. Short
post-deposition annealing at 280 degrees C resulted in improved layer defin
itions as well as improved intralayer order whereas prolonged annealing or
annealing at 390 degrees C resulted in agglomeration of Ag precipitates and
loss of the compositional modulation. A qualitative model based on the imm
iscibility of the Ag-Ni system and different diffusivities of Ag and Ni, is
proposed. (C) 1999 Elsevier Science S.A. All rights reserved.