We have shown previously that porous diamond membranes can be fabricated us
ing a method based on growing diamond on a patterned silicon substrate. The
technique used to pattern the silicon is conventional lithography. In this
work we present a method for reducing the pore size using diamond post-dep
osition over the membrane. An important concern in this work was to determi
ne the pore-shutting rate, considering the time post-deposition and the por
e morphology. (C) 1999 Elsevier Science S.A. All rights reserved.