Laser-induced nano-oxidation on hydrogen-passivated Ge (100) surfaces under a scanning tunneling microscope tip

Citation
Yf. Lu et al., Laser-induced nano-oxidation on hydrogen-passivated Ge (100) surfaces under a scanning tunneling microscope tip, APPL PHYS L, 75(16), 1999, pp. 2359-2361
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
75
Issue
16
Year of publication
1999
Pages
2359 - 2361
Database
ISI
SICI code
0003-6951(19991018)75:16<2359:LNOHG(>2.0.ZU;2-Z
Abstract
Laser-induced nano-oxidation on hydrogen-passivated Ge (100) surfaces under a scanning tunneling microscope tip in air has been investigated. A 532 nm Nd:YAG pulsed laser with a pulse duration of 7 ns was used. A 2 x 2 oxide dot array with dot sizes between 20 and 30 nm and an oxide single line with a width less than 30 nm have been created using an electrochemical-etched tungsten tip under laser irradiation. The modified regions were characteriz ed by atomic force microscope. The apparent depth of oxide layer as a funct ion of laser intensity has been studied. The advantages and drawbacks of us ing a continuous wave laser and a pulsed laser will be discussed. (C) 1999 American Institute of Physics. [S0003-6951(99)03642-6].